SEMI P42 SPECIFICATION OF RETICLE DATA FOR AUTOMATIC RECIPE TRANSFER TO WAFER EXPOSURE SYSTEM
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SEMI P42 Document Information:
Title
SPECIFICATION OF RETICLE DATA FOR AUTOMATIC RECIPE TRANSFER TO WAFER EXPOSURE SYSTEM
Semiconductor Equipment and Materials International
Publication Date:
Mar 1, 2004
Scope:
This standard details frame information in automatic recipe
preparation for wafer exposure equipment. This standard focuses on
communication interface in work flow of design, mask manufacturing,
and wafer manufacturing processes.
This standard defines the items of the required and common
design information at a reticle design and a recipe preparation for
wafer exposure equipment.
This standard defines a data interface, which can be commonly
used independently to the suppliers and models of exposure
equipment.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
This specification defines a common data interface, which
consists of frame information of reticle data, in order to prepare
recipes for wafer exposure tools. By utilizing this interface, it
becomes possible to carry out data handling between design and
wafer manufacture so that the data can be reused during recipe
making of wafer exposure tools. This standard is intended to assist
automatic recipe generation of wafer exposure tools.
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