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Document SEMI P24 is offered by IHS as part of an online subscription. This subscription contains many documents on the same topic.
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SEMI P24 Document Information:
Title
CD METROLOGY PROCEDURES
Semiconductor Equipment and Materials International
Publication Date:
Jan 1, 1994
Scope:
This document discusses determining the performance of
gauging/measurement systems for a very specific application — the
lithography section of integrated circuit wafer fabrication. This
document in many cases, will be applicable to IC mask-making, in
which case the word "mask" can be substituted for "wafer."
It is acknowledged that the final measurement for a fabricated
wafer is the electrical functionality. However, the intermediate
lithographic measurements can be useful in prediction and control
of final functionality. This document is intended to be useful for
this litho-metrology application, irrespective of the technology
employed.
Measurement results and system performance depend on the
sample(s) used. Therefore, performance for different systems or the
same system at different times can only be appropriately compared
when the measurements are obtained with a sample of the same
material composition.
The parameter addressed is precision. Additional important
parameters are reliability and cleanliness, which have been
addressed by other SEMI standards.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
The purpose of this document is to establish uniform procedures
for metrology systems for the lithometrology task. It does not
address how these systems will be applied to solve problems, nor
does it address other contributors to process variations such as
thermal wafer processing, exposure tool focus control, materials,
etc.
Background — Fundamental to manufacturing is the gauging or
measurement process. It is required initially to develop a usable
manufacturing capability and then to verify that what is being
manufactured conforms to specification/expectation.
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