SEMI P35 TERMINOLOGY FOR MICROLITHOGRAPHY METROLOGY
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SEMI P35 Document Information:
Title
TERMINOLOGY FOR MICROLITHOGRAPHY METROLOGY
Semiconductor Equipment and Materials International
Publication Date:
Nov 1, 2006
Scope:
The scope of this document is limited to the definitions of
metrology terms used in microlithography. Every attempt is made to
keep these definitions consistent with relevant international
standards and common usage. This document is not intended to
describe a measurement procedure, but rather an approach to
defining a measurand in a useful and unambiguous way.
The present focus of this document is on feature-related
metrology and measurands important for the definition and control
of lithographic processes.
This document does not attempt to discuss statistical
considerations, which are covered in SEMI E89 and elsewhere.
This document is expected to grow as more terms are added in
future revisions.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
Clear and commonly accepted definitions are needed for efficient
communication and to prevent misunderstanding between buyers and
vendors of metrology equipment. The purpose of this document is to
provide a consistent terminology for the understanding and
discussion of metrology issues important to microlithography.
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