SEMI M40 GUIDE FOR MEASUREMENT OF ROUGHNESS OF PLANAR SURFACES ON SILICON WAFERS

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SEMI M40 Document Information:

Title
GUIDE FOR MEASUREMENT OF ROUGHNESS OF PLANAR SURFACES ON SILICON WAFERS

Semiconductor Equipment and Materials International

Publication Date:
Nov 1, 2009

Scope:

This guide incorporates the following methodologies:

Standardized scan patterns for both local and full-area surface characterization,

A set of roughness abbreviations that describe measurement conditions in a short-hand code, and

Reference test methodologies for three generic types of roughness measuring instruments. These general categories may include, but are not limited to:

• Profilometers — AFM and other scanning probe microscopes; optical profilometers; high-resolution mechanical stylus systems,

• Interferometers — interference microscopes, and

• Scatterometers — Total integrating scatterometers (TIS), angle-resolved light scatterometers (ARLS), scanning surface inspection systems (SSIS).

Procedures to obtain a representative value of roughness for a surface are specified.

Roughness nomenclature is intended to remove ambiguities with respect to identifying the roughness measurements used and the results achieved.

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use.

Purpose

This guide provides procedures for specifying the measurements to be used in characterizing and reporting roughness of the planar surfaces of silicon wafers. It may also be applicable to other types of planar wafer materials. It should be noted that the roughness of polished surfaces of silicons, such as those specified in SEMI M1 is generally in the microroughness range.

This guide provides nomenclature and procedures for roughness determination that employ three key methodologies:

Standardized scan site patterns,

Roughness abbreviations, and

Reference test methodologies with respect to identifying specific roughness measurements.

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