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SEMI M49 Document Information:
Title
GUIDE FOR SPECIFYING GEOMETRY MEASUREMENT SYSTEMS FOR SILICON WAFERS FOR THE 130 nm TO 22 nm TECHNOLOGY GENERATIONS
Semiconductor Equipment and Materials International
Publication Date:
Nov 1, 2008
Scope:
This guide outlines and recommends basic specifications for
systems for measuring geometry and flatness of silicon wafers of
the 130, 90, 65, 45, 32 and 22 nm technology generation.
This guide applies to measurement systems used for verifying the
quality parameters geometry and flatness in large scale production
of bare polished or epitaxial silicon wafers the backside of which
may be acid etched and/or covered by un-patterned, homogeneous
layers of, for example, poly-Si or LTO (low temperature oxide).
Artifacts (e.g., reference materials) for calibrating a measurement
system might have different properties.
This guide also applies to measurement systems that provide only
a subset of the measurement features outlined in this guide.
The guide does not apply to measurement systems used to control
intermediate process steps during Si wafer manufacturing. However,
it may be completely or partly used for measurement systems for
those applications provided corresponding constraints are
appropriately identified.
The guide also does not apply to measurement systems for SOI
wafers or patterned wafers.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
This guide provides recommendations for specifying measurement
systems for geometry and flatness of silicon wafers of the 130, 90,
65, 45, 32 and 22 nm technology generation as anticipated by the
International Technology Roadmap for Semiconductors (ITRS) and in
the forecasts of the major manufacturers of semiconductor devices.
Wafer parameters as defined by SEMI M1, SEMI M8, SEMI M11, SEMI
M24, or SEMI M38 are specified by customers of silicon wafer
suppliers and are usually part of Certificates of Compliance.
Suppliers of silicon wafers and their customers might measure these
parameters using equipment provided by different manufacturers of
such equipment or using different generations of equipment of one
supplier. Agreement on basic features and capability of such
measurement systems improves data exchange and interpretation of
data as well as procurement of appropriate measurement systems.
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