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SEMI M58 Document Information:
Title
TEST METHOD FOR EVALUATING DMA BASED PARTICLE DEPOSITION SYSTEMS AND PROCESSES
Semiconductor Equipment and Materials International
Publication Date:
Nov 1, 2009
Scope:
This test method covers determination of the deposition peak
diameter and the associated expanded relative combined peak
diameter uncertainty produced by a particle deposition system and
its associated deposition procedures for comparison to the 3%
requirement of SEMI M52.
This test method also covers determination of the ability of the
deposition system to produce depositions with diameter
distributions that are less than 5% full width at half maximum
(FWHM) as required by SEMI M52 even when using a particle source
with a much wider distribution.
These tests require that the deposition system employ a DMA (or
an equivalent programmable filtering system) to accomplish both
peak diameter determination and narrowing of particle source
distributions (see Related Information 1).
This test method covers determination of repeatability over a
period of one week. Tests can be repeated periodically to determine
long term stability. Long term stability of most DMA-based particle
deposition systems is believed to be on the order of a year or
more, but it is recommended that the tests be repeated on an annual
basis or whenever the instrument appears to be out of control.
This test method requires the use of three different kinds of
particle distributions with specified characteristics and wafers
that have surface characteristics adequate to allow detection of
the smallest particles utilized with a capture rate of greater than
95%.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
SEMI M52 requires the use of certified reference materials
(CRMs) for calibration of scanning surface inspection systems
(SSISs). The calibration method is defined in SEMI M53. This test
method provides the procedure to determine whether a specific
particle deposition system, using a differential mobility analyzer
(DMA), can produce the required CRMs.
Both organizations producing depositions internally for in-house
use and companies manufacturing depositions for sale can apply this
test method to ensure that their particle deposition systems
provide depositions that meet the requirements of SEMI M52.
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