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Document SEMI E115 is offered by IHS as part of an online subscription. This subscription contains many documents on the same topic.
You may also purchase this document alone from the IHS Standards Store.
SEMI E115 Document Information:
Title
TEST METHOD FOR DETERMINING THE LOAD IMPEDANCE AND EFFICIENCY OF MATCHING NETWORKS USED IN SEMICONDUCTOR PROCESSING EQUIPMENT RF POWER DELIVERY SYSTEMS
Semiconductor Equipment and Materials International
Publication Date:
Mar 1, 2002
Scope:
This document specifies the testing procedures and test
equipment required for determining the load impedance and power
efficiency of a matching network based on the positions of the
tuning elements in the matching network.
The primary focus for this specification is semiconductor
processing equipment including, but not limited to, the following
tool types:
• Dry etch equipment,
• Film deposition equipment (CVD and PVD).
This standard does not address any safety or performance issues
related to RF emissions or electrical codes (e.g., Underwriter's
Laboratory, Inc. (UL), the National Electrical Code (NEC®), Federal
Communications Commission (FCC)). It is the responsibility of the
users of this standard to conform to the appropriate local codes
and regulations as applied to this type of equipment, some of which
are covered by referenced documents.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
The purpose of this document is to define a test method used to
determine the load impedance and efficiency of matching networks
used in RF power delivery systems for semiconductor processing
equipment.
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