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Document SEMI M59 is offered by IHS as part of an online subscription. This subscription contains many documents on the same topic.
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SEMI M59 Document Information:
Title
TERMINOLOGY FOR SILICON TECHNOLOGY
Semiconductor Equipment and Materials International
Publication Date:
Nov 1, 2009
Scope:
This terminology covers general terms describing attributes of
silicon wafers as specified in SEMI M1 and other SEMI Standards as
outlined in SEMI M1. These attributes include electrical,
structural, chemical, and dimensional characteristics of polished
and other types of silicon wafers as well as surface defects and
contamination. Terminology related only to a single specific test
or other attribute is not generally included.
This terminology is applicable for use in connection with
research, development, process control, inspection, and procurement
of silicon material.
Almost all of the terms for which definitions are listed are
nouns. Unless the part of speech is given for any particular term,
it can be assumed that the term is a noun.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
Silicon technology underlies the integrated circuit and device
industry. To promote common understanding and correct communication
between suppliers and customers and others in the field, terms used
in this field should be defined.
This terminology document covers definitions of terms used in
relation to semiconductor silicon crystals and wafers
About IHS
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