SEMI F46 GUIDE FOR ON-SITE CHEMICAL GENERATION (OSCG) SYSTEMS
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SEMI F46 Document Information:
Title
GUIDE FOR ON-SITE CHEMICAL GENERATION (OSCG) SYSTEMS
Semiconductor Equipment and Materials International
Publication Date:
Sep 1, 1999
Scope:
This guide applies to the OSCG system design used for the
generation of chemicals, particularly ultra high purity, used in
the silicon wafer, integrated circuit, and/or substrate
manufacturing processes. These will include, but are not limited
to, various concentrations of NH4OH, HCl, HF, and NH4F aqueous
solutions.
This standard does not purport to address all of the safety
issues associated with its use. It is the responsibility of the
users of this standard to establish appropriate safety and health
practices and determine the applicablity of regulatory limitations
prior to use.
Purpose
This guide establishes the min imum System and Overall
Implementation requirements for requirement of On-Site Chemical
Generation (OSCG) used in semiconductor manufacturing. It is also
intended to establish a common basis for developing detailed guides
in subsequent documents concerning design, performance, and
certification of OSCG systems.
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