SEMI P29 SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASK BLANKS

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SEMI P29 Document Information:

Title
SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASK BLANKS

Semiconductor Equipment and Materials International

Publication Date:
Nov 1, 2005

Scope:

This standard details the attenuated phase shift masks and mask blanks for g-line, i-line, KrF, ArF and/or F2 lithography.

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use.

Purpose

This specification covers the characteristics specific to attenuated phase shift masks and mask blanks.

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