SEMI MF1152 TEST METHODS FOR DIMENSIONS OF NOTCHES ON SILICON WAFERS
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SEMI MF1152 Document Information:
Title
TEST METHODS FOR DIMENSIONS OF NOTCHES ON SILICON WAFERS
Semiconductor Equipment and Materials International
Publication Date:
Mar 1, 2005
Scope:
This test method covers a nondestructive procedure to determine
whether or not the dimensions, except for the blend radius, of
fiducial notches on silicon wafers fall within specified
limits.
This test method is specifically directed to the notch
dimensions specified in SEMI M1, but with suitable modifications,
the principles of this test method may be applied to any desired
notch dimensions.
No test is provided for the blend radius at the apex of the
notch.
The values stated in SI units are to be regarded as the
standard. The values given in parentheses are for information
only.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the user of this standard to establish
appropriate safety and health guides and determine the
applicability of regulatory or other limitations prior to use.
Keywords:
- notch
- notch dimension
- optical comparator
- silicon
- wafer
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