SEMI P21 GUIDELINES FOR PRECISION AND ACCURACY EXPRESSION FOR MASK WRITING EQUIPMENT

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SEMI P21 Document Information:

Title
GUIDELINES FOR PRECISION AND ACCURACY EXPRESSION FOR MASK WRITING EQUIPMENT

Semiconductor Equipment and Materials International

Publication Date:
Jan 1, 1992

Scope:

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use.

Purpose

This guideline describes general requirements concerning precision and accuracy expression of mask writing equipment. Writing accuracy of the mask writing equipment is evaluated by measuring a written mask and is affected greatly by process conditions to be carried out. Therefore, the writing conditions are to be agreed upon by the user and supplier.

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