SEMI G52 STANDARD TEST METHOD FOR MEASUREMENT OF IONIC CONTAMINATION ON SEMICONDUCTOR LEADFRAMES (PROPOSED)

	Purchase Information Use this form to request purchase information on SEMI online subscriptions. SEMI Collections First Name: Last Name: Email address:

Document SEMI G52 is offered by IHS as part of an online subscription. This subscription contains many documents on the same topic.

You may also purchase this document alone from the IHS Standards Store.

SEMI G52 Document Information:

Title
STANDARD TEST METHOD FOR MEASUREMENT OF IONIC CONTAMINATION ON SEMICONDUCTOR LEADFRAMES (PROPOSED)

Semiconductor Equipment and Materials International

Publication Date:
Jan 1, 1990

Scope:

This standard describes the procedure to determine ionic contamination on leadframes using a water extraction method. The method is sensitive to Na⁺, NH₄⁺, K⁺, Cl^-, NO₃ ^-, Br^-, SO₄^2-, PO₄^3-.

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use.

About IHS
IHS (NYSE: IHS) is a leading global provider of critical technical information, decision-support tools and related services in a number of industries including aerospace and defense, automotive, construction, electronics, and energy. IHS serves customers ranging from large governments and multinational corporations to smaller companies and technical professionals in more than 100 countries. IHS been in business for more than 45 years and employ more than 2,300 people around the world.