SEMI F61 GUIDE FOR ULTRAPURE WATER SYSTEM USED IN SEMICONDUCTOR PROCESSING

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SEMI F61 Document Information:

Title
GUIDE FOR ULTRAPURE WATER SYSTEM USED IN SEMICONDUCTOR PROCESSING

Semiconductor Equipment and Materials International

Publication Date:
Mar 1, 2001

Scope:

This guide applies to ultrapure water systems used in semiconductor manufacturing facilities for supplying high purity water for chemical dilutions, wafer processing and other manufacturing processes.

This guide can be used to understand the design elements and functionality of all UPW systems, which includes a Reverse Osmosis (RO) and a Deionization (DI) process. However, it is most applicable to newer designed UPW systems that support submicron linewidth device manufacturing.

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use.

Purpose

This guide establishes the typical definitional requirements for an ultrapure water (UPW) system used in semiconductor manufacturing. It is intended to establish a common basis for developing detailed specifications in subsequent documents concerning design, performance and certification and monitoring of UPW systems.

This document may be used by users and suppliers as a basis for developing site-specific UPW specifications and performance criteria.

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