SEMI F63 GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING
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SEMI F63 Document Information:
Title
GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING
Semiconductor Equipment and Materials International
Publication Date:
Mar 1, 2009
Scope:
Water is used extensively in the production of semiconductor
devices for all wet processing steps such as the rinsing of wafers.
Ultrapure Water (UPW) is typically produced for this purpose using
Reverse Osmosis/Deionized resin bed technologies. The quality of
the water impacts device yield and as linewidths decrease,
requirements for higher purity water may increase.
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
This guide is provided for multiple purposes. It may be used as
a basis for establishing performance criteria for purchases of new
UPW equipment. It may also be used internally by facility engineers
to set process control parameters for the operation of their UPW
systems. This guide may be used by process engineers to establish
reasonable expectations about the quality of the UPW being supplied
to them by facilities.
NOTE 1: These suggested guidelines are published as technical
information and are intended for informational purposes only.
About IHS
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