 |
| Purchase Information |
| Use this form to request purchase information on SEMI online subscriptions. |
|
|
Document SEMI E143 is offered by IHS as part of an online subscription. This subscription contains many documents on the same topic.
You may also purchase this document alone from the IHS Standards Store.
SEMI E143 Document Information:
Title
TEST METHOD FOR MEASURING POWER VARIATION INTO A 50-O LOAD AND POWER VARIATION AND SPECTRUM INTO A LOAD WITH A VSWR OF 2.0 AT ANY PHASE ANGLE
Semiconductor Equipment and Materials International
Publication Date:
Mar 1, 2006
Scope:
This test method specifies the testing procedures and test
equipment required for precisely determining the output power and
spectral variations of RF generators. This test method uses a
spectrum analyzer, power meter, and signal sampling device, all of
which have been previously calibrated by a suitable method
recommended by the manufacturer. This test method is used to
validate three main performance characteristics of RF generators in
order to support the following SEMI E113 specifications:
This test method is used to validate that RF generators shall
provide consistent power delivery with a variation of less than ±1%
of the requested power level (over time and during steady state
wafer processing conditions) when operated into a matched (50-O)
load.
This test method is used to validate that RF generators shall
provide consistent power delivery with a variation of less than
±1.5% of the requested power level (over time and during steady
state wafer processing conditions) when operated into a load
impedance with a reflection coefficient of =0.33 at any phase angle
(VSWR of =2.0) from 10% to 100% of the maximum rated output
power.
This test method is used to validate that RF generators
providing a single or fixed frequency output shall provide an
output power harmonic or spurious spectral content of -40 dB or
less when operated into a load impedance with a reflection
coefficient of =0.33 at any phase angle (VSWR of =2.0) from 10% to
100% of the maximum rated output power.
This test method can also be used to validate output power
harmonic or spurious spectral content for variableor
multiple-frequency output RF generators provided that the following
two conditions are met and understood:
The variable frequency RF generator must be placed in a single
fixed frequency mode for purposes of this test in order to obtain
valid results.
The output power harmonic or spurious spectral content of the
variable frequency RF generator will typically be higher than the
-40 dB requirement for a fixed frequency RF generator.
The primary focus for this test method is semiconductor
processing equipment including, but not limited to, the following
equipment types:
• Dry etch equipment
• Film deposition equipment (CVD and PVD)
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
The purpose of this test method is to provide an accurate method
for measuring the output power and spectral content of RF
generators being driven into both matched and mismatched loads to
simulate their actual performance in RF power delivery systems for
semiconductor processing equipment to support SEMI E113.
About IHS
IHS (NYSE: IHS) is a leading global provider of critical technical information, decision-support tools and related services in a number of industries including aerospace and defense, automotive, construction, electronics, and energy. IHS serves customers ranging from large governments and multinational corporations to smaller companies and technical professionals in more than 100 countries. IHS been in business for more than 45 years and employ more than 2,300 people around the world.
