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Document SEMI P32 is offered by IHS as part of an online subscription. This subscription contains many documents on the same topic.
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SEMI P32 Document Information:
Title
TEST METHOD FOR DETERMINATION OF TRACE METALS IN PHOTORESIST
Semiconductor Equipment and Materials International
Publication Date:
Nov 1, 2004
Scope:
This document applies to a measurement of trace metal
concentration in ppb level in photoresist by instrumental
techniques, such as Atomic Absorption Spectrometry, Plasma Ion
Source Mass Spectrometry, and Inductively Coupled Plasma Atomic
Emission Spectrometry.
Object metals in this measurement are Al, Ca, Cr, Cu, Fe, Mg,
Mn, Ni, K, and Na.
Either additional metals or fewer can be agreed upon between
users and suppliers and are added to the measurement list.
The following method has given satisfactory results in
determining trace metal impurities at the specified value for each
of the target trace metals. Alternative methods or conditions may
be used as long as appropriate studies demonstrate recovery between
75% - 125% of a known sample spike for half the specification
value. The results should be reported as within specification
(below a certain value) or not in specification only (SEMI C1).
NOTICE: This standard does not purport to
address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Purpose
This document describes an outline of a quantitative analysis
method on trace metal concentration. This standard is intended to
promote communication between users and suppliers.
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